products
제품
Filter EPD
Sensor detecting endpoint at etching process by detecting the change
to etchant or by-product after receiving the light
of plasma in semiconductor ash/strip chamber
PR/ACL strip
Single or dual filter type
Endpoint detection by EPD algorithm
Specifications
Target gas OH/CH
Optical resolution 10nm
Installation Direct contact on viewport
Operating temperature 10~50°C
Power requirement ±15VDC input
Dark offset 30±5mV
Model
Single F-EPD
Model Description Model Description
NEFL-309S Gain/offset adjustable(analog VR)
55(W)X95(H)X53(D)mm
NEFL-309SF Gain/offset adjustable(analog VR)
Forced air cooling
55(W)X95(H)X53(D)mm
Model Description
NEFL-309S Gain/offset adjustable(analog VR)
55(W)X95(H)X53(D)mm
NEFL-309SF Gain/offset adjustable(analog VR)
Forced air cooling
55(W)X95(H)X53(D)mm
Dual F-EPD
FD20
PD20i
Model Description Model Description
HDPLUS
-H/M/L
Recipe setting
Gain/offset adjustable(analog VR)
Forced air cooling
TCP/IP or analog output, 3.5” touch LCD
111(W)X89(H)X70(D)mm
HDPLUSi Recipe setting
Gain/offset adjustable(Digital AGC)
Forced air cooling
TCP/IP output, 3.5” touch LCD
Enhanced amplification range, pre-calibration
129(W)X89(H)X70(D)mm
FD20
PD20i
FD20 Gain/offset adjustable(analog VR)
Forced air cooling
0~10VDC analog output
62(W)X94(H)X93(D)mm
PD20i Enhanced sensitivity
Gain/offset adjustable(analog VR)
Forced air cooling
TCP/IP output
106(W)x58(H)x128(D)mm
Model Description
HDPLUS
-H/M/L
Recipe setting
Gain/offset adjustable(analog VR)
Forced air cooling
TCP/IP or analog output, 3.5” touch LCD
111(W)X89(H)X70(D)mm
HDPLUSi Recipe setting
Gain/offset adjustable(Digital AGC)
Forced air cooling
TCP/IP output, 3.5” touch LCD
Enhanced amplification range, pre-calibration
129(W)X89(H)X70(D)mm
FD20 Gain/offset adjustable(analog VR)
Forced air cooling
0~10VDC analog output
62(W)X94(H)X93(D)mm
PD20i Enhanced sensitivity
Gain/offset adjustable(analog VR)
Forced air cooling
TCP/IP output
106(W)x58(H)x128(D)mm
Concept & Configuration
Single filter type
Dual filter type
Firmware