products
제품
Plasma Monitor
Sensor monitoring the plasma in semiconductor/display process chamber
to analyze the arching, intensity distribution or pulsing property
Semiconductor, LCD/OLED, etc.
Etch, plasma treatment, PR/ACL strip
Single sensor, 1D linear sensor, 2D image sensor
Specifications
Spectral range 400~1100nm
Condensing Lens module
A/D converting 16bit
Sensitivity adjustment Gain/offset adjustable
Operating system Win10
Computing hardware High performance type
Software Included as by application
Communication Ethernet
Model
Sensor head
Model Description
2PM-ADU
Single sensor
Pulsed plasma analysis or arc detection
2us sampling period
5~16º viewing angle
Nano2PM or NanoPAM software
ADPLUS 1D CMOS sensor
Plasma intensity distribution
60us sampling period
32 zone-divided viewing
NanoArcD software
Controller for sensor head
Model Description
SMC-10
Horizontal type
3U 19” rack mount type
SMC-10HeU Vertical type
Stand alone type
Concept & Configuration
Software
Nano2PM
NanoArcD
Application
Arc detection
Realtime detection of arcing in semiconductor/display process chamber,
thereby detecting the defect by particle at early stage
Plasma treatment process can be used
Prevention of particle defect
Pulsed plasma analysis
Process modeling through numerical analysis of the characteristics
of pulsed plasma used in semiconductor/display process chamber
Pulsed plasma etch, PEALD can be used
Plasma intensity, pulse on/off time, Measurement of rising/falling time
Frequency/period, Estimate of duty rate
Plasma 1D linear time series analysis
Time series analysis of linear distribution
of plasma in chamber can be achieved
Linear distribution of plasma can be confirmed
Analysis of 32 zone-divided by 60us sampling time