products
제품
Plasma Monitor
Sensor analyzes arcing, intensity distribution, or pulsing properties by monitoring plasma in semiconductor/display process chambers
Semiconductor, LCD/OLED, etc.
Etch, plasma treatment, PR/ACL strip
Single sensor, 1D linear sensor, 2D image sensor
Specifications
Spectral range 400~1100nm
Condensing Lens module
A/D converting 16bit
Sensitivity adjustment Gain/offset adjustable
Operating system Win10
Computing hardware High performance type
Software Included as by application
Communication Ethernet
Model
Sensor head
Model Description
2PM-ADU
Single sensor
Pulsed plasma analysis or arc detection
2us sampling period
5~16º viewing angle
Nano2PM or NanoPAM software
ADPLUS 1D CMOS sensor
Plasma intensity distribution
60us sampling period
32 zone-divided viewing
NanoArcD software
Controller for sensor head
Model Description
SMC-10
Horizontal type
3U 19” rack mount type
SMC-10HeU Vertical type
Stand alone type
Concept & Configuration
Software
Nano2PM
NanoArcD
Application
Arc detection
Real-time detection of arcing in semiconductor/display process chambers
allow early detection of defects caused by foreign particles
Used in plasma treatment process
Prevention of particle defect
Pulsed plasma analysis
For numerical analysis and process modeling of
pulsed plasma characteristics used in
semiconductor/display process chambers
Pulsed plasma etch, Can be used with PEALD
Plasma intensity, pulse on/off time, Rising/falling time measurement
Frequency/period, Duty rate calculation
Plasma 1D linear time series analysis
Time series analysis for linear distribution of
plasma in chambers
Can check linear distribution of plasma
32 zone-divided analysis with 60us sampling time