products
제품
Plasma Monitor
监测半导体/面板设备反应腔室内的等离子体，分析arcing，
intensity distribution或pulsing property的传感器
intensity distribution或pulsing property的传感器
Semiconductor, LCD/OLED 等领域
Etch, plasma treatment, PR/ACL strip
Single sensor, 1D linear sensor, 2D image sensor
Specifications
| Spectral range | 400~1100nm |
| Condensing | Lens module |
| A/D converting | 16bit |
| Sensitivity adjustment | Gain/offset adjustable |
| Operating system | Win10 |
| Computing hardware | High performance type |
| Software | Included as by application |
| Communication | Ethernet |
Model
Sensor head
| Model | Description | |
| 2PM-ADU |
|
Single sensor Pulsed plasma analysis or arc detection 2us sampling period 5~16º viewing angle Nano2PM or NanoPAM software |
| ADPLUS |
1D CMOS sensor Plasma intensity distribution 60us sampling period 32 zone-divided viewing NanoArcD software |
Controller for sensor head
| Model | Description | |
| SMC-10 |
|
Horizontal type 3U 19” rack mount type |
| SMC-10HeU |
Vertical type Stand alone type |
Concept & Configuration
Software
Nano2PM
NanoArcD
Application
Arc detection
实时监测半导体/面板设备反应腔室内的arcing，
可在初期监测到因particle造成的不良 可使用于Plasma treatment工艺 预防因Particle造成的产品不良
可在初期监测到因particle造成的不良 可使用于Plasma treatment工艺 预防因Particle造成的产品不良
Pulsed plasma analysis
将半导体/面板设备反应腔室中使用的pulsed plasma特性以数值方式进行分析，
可建立工艺流程模型 Pulsed plasma etch, 可用于PEALD Plasma intensity, pulse on/off time, 测定rising/falling time Frequency/period, 计算duty rate
可建立工艺流程模型 Pulsed plasma etch, 可用于PEALD Plasma intensity, pulse on/off time, 测定rising/falling time Frequency/period, 计算duty rate
Plasma 1D linear time series analysis
可对反应腔室内等离子体的线性分布进行时间序列分析
可确认等离子体的线性分布
以60us sampling time进行32 zone-divided分析
