products
제품
Plasma Monitor
监测半导体/面板设备反应腔室内的等离子体,分析arcing,
intensity distribution或pulsing property的传感器
Semiconductor, LCD/OLED 等领域
Etch, plasma treatment, PR/ACL strip
Single sensor, 1D linear sensor, 2D image sensor
Specifications
Spectral range 400~1100nm
Condensing Lens module
A/D converting 16bit
Sensitivity adjustment Gain/offset adjustable
Operating system Win10
Computing hardware High performance type
Software Included as by application
Communication Ethernet
Model
Sensor head
Model Description
2PM-ADU
Single sensor
Pulsed plasma analysis or arc detection
2us sampling period
5~16º viewing angle
Nano2PM or NanoPAM software
ADPLUS 1D CMOS sensor
Plasma intensity distribution
60us sampling period
32 zone-divided viewing
NanoArcD software
Controller for sensor head
Model Description
SMC-10
Horizontal type
3U 19” rack mount type
SMC-10HeU Vertical type
Stand alone type
Concept & Configuration
Software
Nano2PM
NanoArcD
Application
Arc detection
实时监测半导体/面板设备反应腔室内的arcing,
可在初期监测到因particle造成的不良
可使用于Plasma treatment工艺
预防因Particle造成的产品不良
Pulsed plasma analysis
将半导体/面板设备反应腔室中使用的pulsed plasma特性以数值方式进行分析,
可建立工艺流程模型
Pulsed plasma etch, 可用于PEALD
Plasma intensity, pulse on/off time, 测定rising/falling time
Frequency/period, 计算duty rate
Plasma 1D linear time series analysis
可对反应腔室内等离子体的线性分布进行时间序列分析
可确认等离子体的线性分布
以60us sampling time进行32 zone-divided分析