특장점 |
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√ 국내 시장 점유율 1위 ! √ 풍부한 해외 납입 실적 (미국,일본,중국 4,000여대) √ 내구성 향상을 위한 다양한 기술 보유 √ 안정적인 시스템 구조 및 데이터 처리 방식 √ 다양한 공정 적용 경험 및 노하우
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Customer Benefits
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√ Technical expertise, all products developed our own technology √ Continuous upgrade in the application in response to customer feedback √ H/W, S/W customization options available to fit customer needs
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1. Application |
- PVD, (PE)CVD, (PE)ALD, Etcher, all TM @semiconductor/display manufacturing - Ti TM/PM, W PM, WN TM/PM/Ex, TSN TM, C&C(Si etch) TM, OxALD PM, Diffusion PM - In-situ leak detection - ALD Source monitoring - Dry cleaning endpoint optimization - Process fault detection - In-situ fault detection caused by any chamber condition’s changes - Necessary in-situ gas monitoring to prevent unexpected process accident |
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2. Features |
- RF plasma ignition : 0mT~10Torr - In-situ monitoring for 200~850nm - Use highly sensitive CCD sensor(2,048pixels) - Advanced EPD algorithms : Fine leak detection algorithm, Life time management |
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3. SPOES vs. RGA (in CVD/ALD/Etcher processes) |
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SPOES |
Features |
RGA |
0mT~10Torr |
Pressure range |
< 5x10-3Torr |
Good |
In-situ monitor |
Impossible because of damaging from reactant gases such as F, Cl |
No need |
Additional pumping |
Need |
No need |
Internal filament |
Need |
Possible |
Self cleaning |
Impossible |
Window & Tube (>1 year) |
Maintenance parts (Period) |
Filament (< 3 months) | |
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Specification |
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Category |
Item |
Description |
Pressure |
Starting Pressure of Discharge |
0mT~10Torr |
Composition |
Detectors / Controller |
1~4 (Max. 12) |
Optic |
CCD Sensor |
2048 pixels / 16bits |
Spectral Range |
200~850nm (UV to NIR) |
Optical Resolution |
<±0.5nm |
Integration Time |
Min. 7ms |
Scan Time (Interval Time) |
Min. 50ms |
Optical Window |
Sapphire |
Power |
CCD Plasma Source Power |
Max. 30W |
Power Requirement |
3.5A/12VDC |
Operation |
Operating System |
Windows XP, Windows7 |
Software |
AOS (AEGIS Operating Software) |
Communication |
Ethernet |
Protocol |
TCP/IP, SECS, SECSII/GEM, SSCP Customiztion options available |
Mechanic |
Additional Pumping |
N/A |
Vacuum Interface |
ISO NW25 (Reducer Available) | |
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Model |
1. Detector
√ Life time 연장을 위한 공정별 특화 모델 제안 !!! |
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사진 |
설명 |
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AEGIS-7W - for Process Chamber (Tungsten) - Contamination Free Module Upgrade (patented) |
AEGIS-7NH - for Process Chamber(use at the case of contamination from viscous powder) - Contamination Free Module Upgrade (patented) - Heating Type | |
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2. Controller
√ 설치환경, 고객 기호에 따른 최적 모델 제안 !!! |
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사진 |
설명 |
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SMC-10 (standard type) - Horizontal Type - 3U 19” rack mount type |
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SMC-10H (I) - Vertical Type - Keyboard, Mouse, Monitor all in one type |
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SMC-10H (II) - Vertical Type - with Work Table & Monitor Arm | |
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Application |
1. Leak Detection |
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2. Cleaning Optimization |
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3. Process Analysis |
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4. ALD Source Verification |
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