| 특장점 |
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√ 국내 시장 점유율 1위 !
√ 풍부한 해외 납입 실적 (미국,일본,중국 4,000여대)
√ 내구성 향상을 위한 다양한 기술 보유
√ 안정적인 시스템 구조 및 데이터 처리 방식
√ 다양한 공정 적용 경험 및 노하우
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Customer Benefits
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√ Technical expertise, all products developed our own technology
√ Continuous upgrade in the application in response to customer feedback
√ H/W, S/W customization options available to fit customer needs
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| 1. Application |
- PVD, (PE)CVD, (PE)ALD, Etcher, all TM @semiconductor/display manufacturing
- Ti TM/PM, W PM, WN TM/PM/Ex, TSN TM, C&C(Si etch) TM, OxALD PM, Diffusion PM
- In-situ leak detection
- ALD Source monitoring
- Dry cleaning endpoint optimization
- Process fault detection
- In-situ fault detection caused by any chamber condition’s changes
- Necessary in-situ gas monitoring to prevent unexpected process accident |
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| 2. Features |
- RF plasma ignition : 0mT~10Torr
- In-situ monitoring for 200~850nm
- Use highly sensitive CCD sensor(2,048pixels)
- Advanced EPD algorithms : Fine leak detection algorithm, Life time management |
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| 3. SPOES vs. RGA (in CVD/ALD/Etcher processes) |
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SPOES |
Features |
RGA |
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0mT~10Torr |
Pressure range |
< 5x10-3Torr |
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Good |
In-situ monitor |
Impossible because of damaging
from reactant gases such as F, Cl |
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No need |
Additional pumping |
Need |
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No need |
Internal filament |
Need |
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Possible |
Self cleaning |
Impossible |
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Window & Tube (>1 year) |
Maintenance parts (Period) |
Filament (< 3 months) | |
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Specification |
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Category |
Item |
Description |
| Pressure |
Starting Pressure of Discharge |
0mT~10Torr |
| Composition |
Detectors / Controller |
1~4 (Max. 12) |
| Optic |
CCD Sensor |
2048 pixels / 16bits |
| Spectral Range |
200~850nm (UV to NIR) |
| Optical Resolution |
<±0.5nm |
| Integration Time |
Min. 7ms |
| Scan Time (Interval Time) |
Min. 50ms |
| Optical Window |
Sapphire |
| Power |
CCD Plasma Source Power |
Max. 30W |
| Power Requirement |
3.5A/12VDC |
| Operation |
Operating System |
Windows XP, Windows7 |
| Software |
AOS (AEGIS Operating Software) |
| Communication |
Ethernet |
| Protocol |
TCP/IP, SECS, SECSII/GEM, SSCP
Customiztion options available |
| Mechanic |
Additional Pumping |
N/A |
| Vacuum Interface |
ISO NW25 (Reducer Available) | |
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| Model |
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1. Detector
√ Life time 연장을 위한 공정별 특화 모델 제안 !!! |
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| 사진 |
설명 |
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AEGIS-7W
- for Process Chamber (Tungsten)
- Contamination Free Module Upgrade (patented) |
AEGIS-7NH
- for Process Chamber(use at the case of contamination from
viscous powder)
- Contamination Free Module Upgrade (patented)
- Heating Type | |
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2. Controller
√ 설치환경, 고객 기호에 따른 최적 모델 제안 !!! |
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| 사진 |
설명 |
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SMC-10 (standard type)
- Horizontal Type
- 3U 19” rack mount type |
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SMC-10H (I)
- Vertical Type
- Keyboard, Mouse, Monitor all in one type |
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SMC-10H (II)
- Vertical Type
- with Work Table & Monitor Arm | |
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| Application |
| 1. Leak Detection |
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| 2. Cleaning Optimization |
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| 3. Process Analysis |
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| 4. ALD Source Verification |
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English
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